Improving metrology for micro-optics manufacturing

Angela D. Davies; Brent C. Bergner; Neil W. Gardner

doi:10.1117/12.505057

10 November 2003 Improving metrology for micro-optics manufacturing

Angela D. Davies, Brent C. Bergner, Neil W. Gardner

Proceedings Volume 5177, Gradient Index, Miniature, and Diffractive Optical Systems III; (2003) https://doi.org/10.1117/12.505057
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

Metrology is one of the critical enabling technologies for realizing the full market potential for micro-optical systems. Measurement capabilities are currently far behind present and future needs. Much of today’s test equipment was developed for the micro-electronics industry and is not optimized for micro-optic materials and geometries. Metrology capabilities currently limit the components that can be realized, in many cases. Improved testing will be come increasingly important as the technology moves to integration where it will become important to “test early and test often” to achieve high yields. In this paper, we focus on micro-refractive components in particular, and describe measurement challenges for this class of components and current and future needs. We also describe a new micro-optics metrology research program at UNC Charlotte under the Center for Precision Metrology and the new Center for Optoelectronics and Optical Communications to address these needs.

Citation Download Citation

Angela D. Davies, Brent C. Bergner, and Neil W. Gardner "Improving metrology for micro-optics manufacturing", Proc. SPIE 5177, Gradient Index, Miniature, and Diffractive Optical Systems III, (10 November 2003); https://doi.org/10.1117/12.505057

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