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Multiple high-period-accuracy gratings fabricated by holographic exposure and ion-beam etching with nanometer depth accuracy in silicon
Techniques and uncertainty analysis for interferometric surface figure error measurement of spherical mirrors at 20K
Characterization of aspherical surface that has high numerical aperture by using a computer-generated hologram
Measurement of surface figure and optical thickness variation of a thin parallel plate in wavelength-scanned interferometry with minimized laser tuning range