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10 November 2003 Ridge waveguide optical taps on silicon substrates
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Abstract
A compact, low loss, optical tap technology is critical for the incorporation of optical interconnects into mainstream semiconductor processes. Previously, we introduced a vertical multimode interference effect based tap device that had the potential for very high speed optical to electrical performance in compact, rectangular device geometries, and in CMOS compatible processes. In this work, we report on the fabrication and test of various ridge guide based optical tap structures on silicon substrates. The experimental results compared well with simulations. Optimized guide to substrate optical coupling was varied from 2 dB to 3 dB by insertion of a spacer layer. Substrate-isolated (passive) tap structure loss of less than 0.6 dB at 840nm wavelength was measured. Based on the device geometry, this result indicated actual tap excess losses (energy fraction not collected by the substrate) to be less than 0.3 dB. Overall, the test results confirm the low excess loss, multimode interference operation of the new tap design, and pave the way for integration of the tap structures with CMOS photo detector devices.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vincent Stenger and Fred Richard Beyette Jr. "Ridge waveguide optical taps on silicon substrates", Proc. SPIE 5181, Wave Optics and Photonic Devices for Optical Information Processing II, (10 November 2003); https://doi.org/10.1117/12.508003
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