3 November 2003 Analog proximity-photolithography with mask aligners for the manufacturing of micro-optical elements
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Abstract
We report on a new approach in analog photolithography for the manufacturing of optical elements with a continuous profile. It is based on a phase-only mask used in a mask aligner.The advantage of this new approach is that it is contact free, i.e.there is a gap between the mask and the substrate during the exposure. That allows a non-destructive mask lithography.
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Tobias Erdmann, Matthias Cumme, Lars-Christian Wittig, Ernst-Bernhard Kley, Frank Wyrowski, Andreas Tuennermann, "Analog proximity-photolithography with mask aligners for the manufacturing of micro-optical elements", Proc. SPIE 5183, Lithographic and Micromachining Techniques for Optical Component Fabrication II, (3 November 2003); doi: 10.1117/12.505751; https://doi.org/10.1117/12.505751
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KEYWORDS
Photomasks

Manufacturing

Lithography

Beam shaping

Analog electronics

Optical components

Photoresist processing

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