Paper
3 November 2003 Fabrication of micro-optical elements on a glass surface by imprint lithography
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Abstract
Low-cost micro fabrication technique is indispensable for mass production of micro optical elements. Si very large-scale integration (VLSI) fabrication technology such as electron beam lithography or advanced photo lithography is generally applied to fabricate micro structures, however the production cost is too expensive for mass production of optical elements. To overcome the problem, imprint lithography is one of the promising method to fabricate micro structures at low cost. Various shaped mold is fabricated by semiconductor process technology. Process conditions such as temperature or pressure are designed to avoid fracture of the glass plate. Fine gratings, fine blazed and various shaped structures are successfully achieved on the glass surface without fatal defects. The cross-sectional profile of the imprinted structure is fairly good and surface roughness is less than a few nano meters.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takehiko Yamaguchi, Kazuyuki Yao, Tomohiro Kanakugi, Seiichirou Kitagawa, and Yoshihiko Hirai "Fabrication of micro-optical elements on a glass surface by imprint lithography", Proc. SPIE 5183, Lithographic and Micromachining Techniques for Optical Component Fabrication II, (3 November 2003); https://doi.org/10.1117/12.505413
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Cited by 3 scholarly publications.
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KEYWORDS
Glasses

Lithography

Optical components

Atomic force microscopy

Silicon

Surface roughness

Electron beam lithography

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