E-beam lithography and optical near-field lithography: new prospects in fabrication of various grating structures

Ernst-Bernhard Kley; Tina Clausnitzer

doi:10.1117/12.504583

29 December 2003 E-beam lithography and optical near-field lithography: new prospects in fabrication of various grating structures

Ernst-Bernhard Kley, Tina Clausnitzer

Author Affiliations +

Proceedings Volume 5184, Physics, Theory, and Applications of Periodic Structures in Optics II; (2003) https://doi.org/10.1117/12.504583
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

Today’s technologies available for the fabrication of micro structured optical elements are well developed for defined classes of structures. Techniques for very complex optical functions or for combinations of optical functions together with others are more or less in the level of research or labs. A promising approach for complex grating fabrication is the use of optical near field holography (NFH) and e-beam writing for unification of the advantages. The paper wants to show the potential of both techniques itself as well as the potential that arises from their teamwork. The paper demonstrates one and two dimensional gratings, chirped and unidirectional gratings fabricated by NFH using e-beam written masks. It shows also possibilities for the fabrication of gratings on binary, multilevel and continuous optical profiles.

Citation Download Citation

Ernst-Bernhard Kley and Tina Clausnitzer "E-beam lithography and optical near-field lithography: new prospects in fabrication of various grating structures", Proc. SPIE 5184, Physics, Theory, and Applications of Periodic Structures in Optics II, (29 December 2003); https://doi.org/10.1117/12.504583

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