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Manufacturability considerations in designing optical monitoring methods for control of plasma etch processes
Thin film 193nm TNK measurement using multi-domain genetic algorithm (MDGA) with a combination of beam profile reflectometry (BPR), absolute ellipsometry (AE), and spectroscopic ellipsometry (SE)
Three-dimensional reconstruction of refractive index distribution in optical phase elements by interferometric and photoelastic tomography
Recent advances in the development of phase-shifting liquid crystal interferometers for visible and near-IR applications
One way to accomplish the advanced requests of nanometrology: the nanometer coordinate measuring machine (NCMM)
Enhancement and quenching of the fluorescence of single CdSe/ZnS quantum dots studied by confocal apertureless near-field scanning optical microscope
Comparative linewidth measurements on chrome and MoSi structures using newly developed microscopy methods