4 November 2003 At-wavelength metrology on Sc-based multilayers for the UV and water window
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Due to the unusual behavior of its optical constants the first transition element Sc with atomic configuration (3p64s23d) is a very attractive candidate for multilayer coatings optimized for the anomalous dispersion region of the 3p-3d transition around 28 eV (45 nm) and for the vicinity of the 2p absorption edge at 398 eV (3.12 nm), respectively. New normal incidence reflectivity data for Sc/Si at Sc 3p are shown with peak values up to 54% and for Cr/Sc at Sc 2p with peak values up to 17% are presented. The influence of optical performance on multilayer growth conditions and parameters are discussed in detail and the necessity of at-wavelength metrology for the final characterization is demonstrated. The results encourage e.g. applications for normal incidence optics used for high-power pulsed UV and x-ray laser systems and for x-ray microscopes operated in the water window.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Franz Schaefers, Sergiy A. Yulin, Torsten Feigl, Norbert Kaiser, "At-wavelength metrology on Sc-based multilayers for the UV and water window", Proc. SPIE 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, (4 November 2003); doi: 10.1117/12.505695; https://doi.org/10.1117/12.505695


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