4 November 2003 At-wavelength metrology on Sc-based multilayers for the UV and water window
Author Affiliations +
Due to the unusual behavior of its optical constants the first transition element Sc with atomic configuration (3p64s23d) is a very attractive candidate for multilayer coatings optimized for the anomalous dispersion region of the 3p-3d transition around 28 eV (45 nm) and for the vicinity of the 2p absorption edge at 398 eV (3.12 nm), respectively. New normal incidence reflectivity data for Sc/Si at Sc 3p are shown with peak values up to 54% and for Cr/Sc at Sc 2p with peak values up to 17% are presented. The influence of optical performance on multilayer growth conditions and parameters are discussed in detail and the necessity of at-wavelength metrology for the final characterization is demonstrated. The results encourage e.g. applications for normal incidence optics used for high-power pulsed UV and x-ray laser systems and for x-ray microscopes operated in the water window.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Franz Schaefers, Franz Schaefers, Sergiy A. Yulin, Sergiy A. Yulin, Torsten Feigl, Torsten Feigl, Norbert Kaiser, Norbert Kaiser, } "At-wavelength metrology on Sc-based multilayers for the UV and water window", Proc. SPIE 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, (4 November 2003); doi: 10.1117/12.505695; https://doi.org/10.1117/12.505695


EUV multilayers for solar physics
Proceedings of SPIE (January 28 2004)
High performance Cr Sc multilayers for the soft x ray...
Proceedings of SPIE (October 05 2005)
Enhanced reflectivity and stability of Sc/Si multilayers
Proceedings of SPIE (January 12 2004)

Back to Top