Comparative linewidth measurements on chrome and MoSi structures using newly developed microscopy methods

Bernd Bodermann; Werner Mirande; Norbert Kerwien; Alexander Tavrov; Michael Totzeck; Hans Tiziani

doi:10.1117/12.509713

4 November 2003 Comparative linewidth measurements on chrome and MoSi structures using newly developed microscopy methods

Bernd Bodermann, Werner Mirande, Norbert Kerwien, Alexander Tavrov, Michael Totzeck, Hans Tiziani

Author Affiliations +

Proceedings Volume 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies; (2003) https://doi.org/10.1117/12.509713
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

Inspection and linewidths measurements of subwavelength structures using optical microscopy are severely confined both by the limited resolution and by a manifold of light-structure interactions affecting the optical image. To receive a better understanding of these interactions and/or to overcome these limitations new microscopy methods have been developed: Polarization-interference-microscopy permits the accurate measurement of the birefringence which is induced by the form of the structures. By interferometric comparison of the TE and TM-polarized image this method provides selective edge detection and localisation in the subwavelength regime because the polarisation difference is situated at the topographical changes of the structure. Two new methods of dark field microscopy ,"alternating grazing incidence dark field microscopy" and "frustrated internal total reflection microscopy", make it possible to suppress optical proximity effects and to overcome the resolution limit of conventional dark field microscopy. For a characterisation of the qualitative and quantitative influence of different influencing variables on measurements of the size of subwavelength structures we performed comparative linewidths measurements on Chrome and phase shifting MoSi photomask structures. The deliverables are compared with rigorous numerical simulations.

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Bernd Bodermann, Werner Mirande, Norbert Kerwien, Alexander Tavrov, Michael Totzeck, and Hans Tiziani "Comparative linewidth measurements on chrome and MoSi structures using newly developed microscopy methods", Proc. SPIE 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, (4 November 2003); https://doi.org/10.1117/12.509713

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