4 November 2003 Mueller matrix polarimeter in 157nm
Author Affiliations +
Abstract
A vacuum Mueller matrix polarimeter is developed for measurement of the Mueller matrix of samples, partially, calcium fluoride materials in 157nm wavelength. From the measured Mueller matrix with no sample present, we found the influence of absorption error in the detector and orientation error in quarter-wave plates on measurement results. The birefringence of samples is determined from the Mueller matrix. Experimental results show this Mueller matrix polarimeter is available to be used for characterizing the intrinsic birefringence of materials for processed lens at the 157nm lithography.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lianhua Jin, Hiroyuki Kowa, Yukitoshi Otani, Norihiro Umeda, "Mueller matrix polarimeter in 157nm", Proc. SPIE 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, (4 November 2003); doi: 10.1117/12.507038; https://doi.org/10.1117/12.507038
PROCEEDINGS
8 PAGES


SHARE
KEYWORDS
Polarimetry

Birefringence

Optical components

Error analysis

Sensors

Glasses

Luminescence

Back to Top