14 November 2003 The Exicor DUV birefringence measurement system and its application to measuring lithography-grade CaF2 lens blanks
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Abstract
Optical lithography continues its transition to shorter wavelengths to support the semiconductor industry’s production of faster microchips to meet evolving market demands. The next step for optical lithography is likely to use the F2 excimer laser at 157.63 nm (157 nm,according to the industry’ s naming convention).At 157 nm, among the limited number of fluoride crystals with acceptable optical properties calcium fluoride is the only practical lens material for step and scan systems due to its readiness for mass production. Since the discovery of intrinsic birefringence in CaF2 at deep ultraviolet (DUV)wavelengths,the optical lithography industry has developed a critical interest in measuring birefringence at 157 nm. In response to this need, we have developed a DUV birefringence measurement system. In this article,we describe the working principle, system construction, technical performance and selected applications for measuring lithography grade calcium fluoride lens blanks at DUV wavelengths.
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Baoliang Wang, Baoliang Wang, C. Owen Griffiths, C. Owen Griffiths, Rick R. Rockwell, Rick R. Rockwell, Jennifer List, Jennifer List, Doug Mark, Doug Mark, "The Exicor DUV birefringence measurement system and its application to measuring lithography-grade CaF2 lens blanks", Proc. SPIE 5192, Optical Diagnostic Methods for Inorganic Materials III, (14 November 2003); doi: 10.1117/12.506213; https://doi.org/10.1117/12.506213
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