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13 January 2004 Fabrication technology of hard x-ray aspherical mirror optics and application to nanospectroscopy
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Abstract
We developed ultra-precise fabrication system for x-ray optics, which combined numerically controlled plasma CVM and EEM. In this system, nanometer order form accuracy having atomic order roughness is achieved. And there are no deformed layers on the surface because these fabrication processes utilizes chemical reaction. So, this system is effective for not only reflective optics but also for diffractive optics. Recently, elliptical mirrors having less than 3 nm form accuracy are fabricated by utilizing the above system, and K-B arrangement microfocusing unit for installation of these mirrors are developed. In this unit, micro x-ray beam having the size of 180 (V)×90(H) nm2 is achieved at 15 keV. By scanning irradiation of the micro x-ray beam and by detecting x-ray fluorescence, inside structures of some mammalian cells are observed with resolution of 0.2 μm.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuzo Mori, Kazuto Yamauchi, Kazuya Yamamura, Hidekazu Mimura, Yasuhisa Sano, Akira Saito, Katsuyoshi Endo, Alexei Souvorov, Makina Yabashi, Kenji Tamasaku, Tetsuya Ishikawa, Mari Shimura, and Yukihito Ishizaka "Fabrication technology of hard x-ray aspherical mirror optics and application to nanospectroscopy", Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); https://doi.org/10.1117/12.515127
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