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13 January 2004 High-performance multilayer coatings for EUV lithography
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Abstract
We review the specification for the coatings in steppers for extreme ultraviolet (EUV) lithography and discuss the deposition methods that have produced such coatings. Thermal deposition by electron beam, magnetron sputtering, and ion beam deposition have all been able to achieve the requirements for future EUV optics. Ion beam sputtering has produced coatings with very few defects and can smooth substrate roughness and mitigate the effects of substrate defects.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eberhard Spiller "High-performance multilayer coatings for EUV lithography", Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); https://doi.org/10.1117/12.507237
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