Multilayer mirror design for different applications in the XUV using a versatile simulation program

Thomas G. Graf; Alan G. Michette; A. Keith Powell

doi:10.1117/12.508791

13 January 2004 Multilayer mirror design for different applications in the XUV using a versatile simulation program

Thomas G. Graf, Alan G. Michette, A. Keith Powell

Proceedings Volume 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications; (2004) https://doi.org/10.1117/12.508791
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

By combining previous multilayer optics design methods a multilayer mirror program has been developed to provide a versatile tool for multilayer mirror (MLM) design for the XUV range. The optimization program allows variation of the angle of incident radiation, the interface roughness and the number of different materials within the MLM structure. The possibility of optimizing the performance of the MLM using different merit functions or reflectivity profiles has been implemented and makes this program a powerful tool for the design of different multilayer devices. Polarizers have been designed by optimizing at the Brewster angle, and ratios of R_s|R_p around 10³ are achieved for specific wavelengths. To select a specific line from a superimposed line and continuum spectrum from an electron impact or laser plasma source, a selective merit function is used. Applications include the calculation of Al K_α and Ti K_α electron impact source radiation monochromators for the use in microbeam radiation experiments. Other ideas for MLMs where the maximal reflected wavelength is dependent on the angle of incidence are currently being studied. These MLMs are planned for the use in achieving tunability of a microscope running with a continuum source.

Citation Download Citation

Thomas G. Graf, Alan G. Michette, and A. Keith Powell "Multilayer mirror design for different applications in the XUV using a versatile simulation program", Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); https://doi.org/10.1117/12.508791

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