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13 January 2004 Multilayer mirror design for different applications in the XUV using a versatile simulation program
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Abstract
By combining previous multilayer optics design methods a multilayer mirror program has been developed to provide a versatile tool for multilayer mirror (MLM) design for the XUV range. The optimization program allows variation of the angle of incident radiation, the interface roughness and the number of different materials within the MLM structure. The possibility of optimizing the performance of the MLM using different merit functions or reflectivity profiles has been implemented and makes this program a powerful tool for the design of different multilayer devices. Polarizers have been designed by optimizing at the Brewster angle, and ratios of Rs|Rp around 103 are achieved for specific wavelengths. To select a specific line from a superimposed line and continuum spectrum from an electron impact or laser plasma source, a selective merit function is used. Applications include the calculation of Al Kα and Ti Kα electron impact source radiation monochromators for the use in microbeam radiation experiments. Other ideas for MLMs where the maximal reflected wavelength is dependent on the angle of incidence are currently being studied. These MLMs are planned for the use in achieving tunability of a microscope running with a continuum source.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Thomas G. Graf, Alan G. Michette, and A. Keith Powell "Multilayer mirror design for different applications in the XUV using a versatile simulation program", Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); https://doi.org/10.1117/12.508791
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