13 January 2004 Rigorous wavefront analysis of the visible-light point diffraction interferometer for EUVL
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Abstract
In visible-light point diffraction interferometer (PDI), in order to achieve measurement error <0.1 - 0.2 nm rms, wavefront irregularity from the pinhole must be supressed as 0.05 - 0.1 nm rms in designing. It is so difficult to execute such high accurate (10-4λ) simulation because the numerical electromagnetic simulation shows slow convergence in the visible-region. We discussed this problem by using 2D-model and found simulation conditions to obtain significant results. By using the simulator, several kind of systematic erros have been analyzed and optimized.
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Katsura Otaki, Yucong Zhu, Mikihiko Ishii, Shigeru Nakayama, Katsuhiko Murakami, Takashi Gemma, "Rigorous wavefront analysis of the visible-light point diffraction interferometer for EUVL", Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); doi: 10.1117/12.507046; https://doi.org/10.1117/12.507046
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