7 January 2004Characterization of the high-Z 0.9- to 1.0-MA x-pinch source in the 0.15- to 500-keV region: possible applications of the high-current x-pinch as the sub-keV to 10-keV radiation driver and the 50- to 100-keV backlighter
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Experimental results of complex studies of x-ray/EUV radiation from hot dense x-pinch Ti, Fe, Mo, and W plasmas generated by a pulse-powered z-pinch machine with Imax~0.9 ÷ 1.0 MA and a current rise time of 100 ns are overviewed. Structures and spatial dimensions of 0.9-1.0 MA x-pinch sources in a wide energy range of 0.15 - 0.6 keV, 1-10 keV and 10-100 keV are analyzed. Generation of different types of hot spots in high-current multiburst x-pinches are described and a possible explanation of observed effects based on generation of shockwaves in plasmas are discussed. Hard x-ray x-pinch spectra are analyzed. The analysis of time and energy scaling of 0.9 - 1.0 MA x-pinch x-ray/EUV pulses indicate the possible existence of competing mechanisms of the dissipation of the initial discharge x-pinch energy. The future applications of the high current x-pinch as the sub-keV-10 keV radiation driver and the 50 - 100 keV backlighter are discussed.
Victor L. Kantsyrev,Dmitry A. Fedin,Alla S. Shlyaptseva,Stephanie B. Hansen, andNick D. Ouart
"Characterization of the high-Z 0.9- to 1.0-MA x-pinch source in the 0.15- to 500-keV region: possible applications of the high-current x-pinch as the sub-keV to 10-keV radiation driver and the 50- to 100-keV backlighter", Proc. SPIE 5196, Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications, (7 January 2004); https://doi.org/10.1117/12.507908
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Victor L. Kantsyrev, Dmitry A. Fedin, Alla S. Shlyaptseva, Stephanie B. Hansen, Nick D. Ouart, "Characterization of the high-Z 0.9- to 1.0-MA x-pinch source in the 0.15- to 500-keV region: possible applications of the high-current x-pinch as the sub-keV to 10-keV radiation driver and the 50- to 100-keV backlighter," Proc. SPIE 5196, Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications, (7 January 2004); https://doi.org/10.1117/12.507908