7 January 2004 High-efficiency tin-based EUV sources
Author Affiliations +
Abstract
We have previously proposed the use of mass-limited, tin-containing laser plasma sources for EUV lithography applications. Here we report advances in measurements of the spectral output, conversion efficiency, and debris emission from these sources. We also report progress in the use of repeller field debris inhibition techniques for this source.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Martin C. Richardson, Chiew-Seng Koay, Christian K. Keyser, Kazutoshi Takenoshita, Etsuo Fujiwara, Moza M. Al-Rabban, "High-efficiency tin-based EUV sources", Proc. SPIE 5196, Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications, (7 January 2004); doi: 10.1117/12.514083; https://doi.org/10.1117/12.514083
PROCEEDINGS
9 PAGES


SHARE
Back to Top