X-ray and EUV spectral instruments for plasma source characterization

Alexander P. Shevelko; Yuri S. Kasyanov; Larry V. Knight; James Phillips; R. Steven Turley; D. Clark Turner; Oleg F. Yakushev

doi:10.1117/12.507723

7 January 2004 X-ray and EUV spectral instruments for plasma source characterization

Alexander P. Shevelko, Yuri S. Kasyanov, Larry V. Knight, James Phillips, R. Steven Turley, D. Clark Turner, Oleg F. Yakushev

Author Affiliations +

Proceedings Volume 5196, Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications; (2004) https://doi.org/10.1117/12.507723
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

A set of spectral analytic instruments has been developed for absolute intensity measurements in a spectral range of 1 - 600 Å: (1) several modifications of grazing incidence spectrographs; (2) EUV monochromator- spectrometer with a constant angle of deviation; (3) focusing crystal von Hamos spectrometer using cylindrical mica and pyrolytic graphite crystals and a CCD linear array as a detector. These instruments are useful for plasma diagnostics, x-ray and EUV spectroscopy of laser-generated plasmas and capillary discharge plasmas, x-ray and EUV reflectometry, radiometry and x-ray fluorescence application.

Citation Download Citation

Alexander P. Shevelko, Yuri S. Kasyanov, Larry V. Knight, James Phillips, R. Steven Turley, D. Clark Turner, and Oleg F. Yakushev "X-ray and EUV spectral instruments for plasma source characterization", Proc. SPIE 5196, Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications, (7 January 2004); https://doi.org/10.1117/12.507723

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