19 December 2003 New techniques for the measurement of x-ray beam or x-ray optics quality
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Abstract
Metrology of XUV beams and more specifically X-ray laser (XRL) beam is of crucial importance for development of applications. We have then developed several new optical systems enabling to measure the x-ray laser optical properties. By use of a Michelson interferometer working as a Fourier-Transform spectrometer, the line shapes of different x-ray lasers have been measured with an unprecedented accuracy (δλ/λ~10-6). Achievement of the first XUV wavefront sensor has enable to measure the beam quality of laser-pumped as well as discharge pumped x-ray lasers. Capillary discharge XRL has demonstrated a very good wavefront allowing to achieve intensity as high 3*1014 Wcm-2 by focusing with a f = 5 cm mirror. The measured sensor accuracy is as good as λ/120 at 13 nm. Commercial developments are under way.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Philippe Zeitoun, Philippe Balcou, Samuel Bucourt, Djamel Benredjem, Franck Delmotte, Guillaume Dovillaire, Denis Douillet, James Dunn, G. Faivre, Marta Fajardo, Kenneth A. Goldberg, Mourad Idir, Sebastien Hubert, Jim Hunter, Sylvie Jacquemot, Sophie Kazamias, Sebastien le Pape, Xavier Levecq, Ciaran L. S. Lewis, Remy Marmoret, Pascal Mercere, A. S. Morlens, Patrick P. Naulleau, Christian Remond, Jorge J. Rocca, Stephane Sebban, Raymond F. Smith, Marie-Francoise Ravet, Philippe Troussel, Constance Valentin, Laurent Vanbostal, "New techniques for the measurement of x-ray beam or x-ray optics quality", Proc. SPIE 5197, Soft X-Ray Lasers and Applications V, (19 December 2003); doi: 10.1117/12.508183; https://doi.org/10.1117/12.508183
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