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19 December 2003 New techniques for the measurement of x-ray beam or x-ray optics quality
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Abstract
Metrology of XUV beams and more specifically X-ray laser (XRL) beam is of crucial importance for development of applications. We have then developed several new optical systems enabling to measure the x-ray laser optical properties. By use of a Michelson interferometer working as a Fourier-Transform spectrometer, the line shapes of different x-ray lasers have been measured with an unprecedented accuracy (δλ/λ~10-6). Achievement of the first XUV wavefront sensor has enable to measure the beam quality of laser-pumped as well as discharge pumped x-ray lasers. Capillary discharge XRL has demonstrated a very good wavefront allowing to achieve intensity as high 3*1014 Wcm-2 by focusing with a f = 5 cm mirror. The measured sensor accuracy is as good as λ/120 at 13 nm. Commercial developments are under way.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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