Holographic photopolymer materials with nonlocal and nonlinear response

John V. Kelly; Feidhlim T. O'Neill; John T. Sheridan; Cristian Neipp; Sergi Gallego; Manuel Ortuno

doi:10.1117/12.509138

8 December 2003 Holographic photopolymer materials with nonlocal and nonlinear response

John V. Kelly, Feidhlim T. O'Neill, John T. Sheridan, Cristian Neipp, Sergi Gallego, Manuel Ortuno

Proceedings Volume 5216, Organic Holographic Materials and Applications; (2003) https://doi.org/10.1117/12.509138
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

The kinetics of photosensitive polymer holographic recording materials is examined. We discuss why a linear relationship between monomer concentration and polymerization rate does not satisfactorily explain current experimental results and propose a possible solution. Then, using the Rigorous Coupled Wave Model(RCWM) we examine the higher order grating components so as to more clearly understand the non-linear relationship between exposing intensity and polymerization.

Citation Download Citation

John V. Kelly, Feidhlim T. O'Neill, John T. Sheridan, Cristian Neipp, Sergi Gallego, and Manuel Ortuno "Holographic photopolymer materials with nonlocal and nonlinear response", Proc. SPIE 5216, Organic Holographic Materials and Applications, (8 December 2003); https://doi.org/10.1117/12.509138

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