Paper
6 October 2003 Influence of the mirror coating material on the catastrophic optical damage of semiconductor SQW-SCH
Andrzej Jagoda, Lech Dobrzanski, Andrzej Malag, Beata Stanczyk, Sylwia Wrobel, M. Ufnal
Author Affiliations +
Proceedings Volume 5230, Laser Technology VII: Progress in Lasers; (2003) https://doi.org/10.1117/12.531925
Event: 2003 Chapter books, 2003, Bellingham, WA, United States
Abstract
This paper presents results of the investigated levels of Catastrophic Optical Damage of the SQW-SCH lasers mirrors coated with AlN (λ/4n) layer. These results have been compared with COD levels of this same type of the lasers with mirros coated by Si3N4 (λ/4n), thick AlN (3λ/4n) layers, and without coatings.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrzej Jagoda, Lech Dobrzanski, Andrzej Malag, Beata Stanczyk, Sylwia Wrobel, and M. Ufnal "Influence of the mirror coating material on the catastrophic optical damage of semiconductor SQW-SCH", Proc. SPIE 5230, Laser Technology VII: Progress in Lasers, (6 October 2003); https://doi.org/10.1117/12.531925
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KEYWORDS
Mirrors

Coating

Lawrencium

Optical damage

Semiconductors

Diodes

Optical semiconductors

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