25 February 2004 Manufacturing of four-quadrant phase mask for nulling interferometry in the thermal infrared
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Abstract
The Four Quadrant Phase Mask is a key component for the design of advanced coronagraphs that may be used to search exo-planets. The validity of this concept has been demonstrated in the visible and need now to be demonstrated in the mid infrared. For this purpose, two components are manufactured for wavelengths 4.75 and 16.25 μm. This manufacturing requires the deposition of ZnSe layers using Ion Assisted Deposition, followed by a lift off process.
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Frederic Lemarquis, Frederic Lemarquis, Michel Lequime, Michel Lequime, Gerard Albrand, Gerard Albrand, Ludovic Escoubas, Ludovic Escoubas, Jean-Jacques Simon, Jean-Jacques Simon, Jacques Baudrand, Jacques Baudrand, Pierre Riaud, Pierre Riaud, Daniel Rouan, Daniel Rouan, Anthony Boccaletti, Anthony Boccaletti, Pierre Baudoz, Pierre Baudoz, Dimitri Mawet, Dimitri Mawet, } "Manufacturing of four-quadrant phase mask for nulling interferometry in the thermal infrared", Proc. SPIE 5250, Advances in Optical Thin Films, (25 February 2004); doi: 10.1117/12.513386; https://doi.org/10.1117/12.513386
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