Continuous-tone gray-scale photomasks based on photosensitive spin-on-glass technology for deep-UV lithography applications

Edgar A. Mendoza; F. A. Sigoli; H. Paulus; L. Q. Giang; M. Seifouri; E. Lam; Lothar U. Kempen; Farvardin Johansooz

doi:10.1117/12.528092

17 December 2003 Continuous-tone gray-scale photomasks based on photosensitive spin-on-glass technology for deep-UV lithography applications

Edgar A. Mendoza, F. A. Sigoli, H. Paulus, L. Q. Giang, M. Seifouri, E. Lam, Lothar U. Kempen, Farvardin Johansooz

Author Affiliations +

Proceedings Volume 5256, 23rd Annual BACUS Symposium on Photomask Technology; (2003) https://doi.org/10.1117/12.528092
Event: Photomask Technology, 2003, Monterey, California, United States

Abstract

A technology for the low cost production of continuous tone gray scale photomasks for deep UV photolithography applications has been demonstrated. This technology is based on the use of a photosensitive spin-on-glass (SOG) thin film deposited onto a UV transparent substrate such as quartz. Different light exposure energies, from either a lithography setup or a laser pattern generator, onto the photosensitive SOG film changes the UV absorption spectrum at both H and I mercury emission lines. The amount of photo induced attenuation on the film is directly proportional to light exposure energy, hence allowing the formation of fully continuous tone patterns. Once the image pattern is photo-generated with a resolution of 0.1 to 1 micrometer, it is permanently fixed by a thermal treatment step without the need of an etching step. This new continuous tone deep UV photomask technology offers new cost effective opportunities for the production of micro-electro-mechanical systems (MEMS) structures, diffractive optical elements (DOEs), computer generated holograms (CGHs), and kinoform optics.

Citation Download Citation

Edgar A. Mendoza, F. A. Sigoli, H. Paulus, L. Q. Giang, M. Seifouri, E. Lam, Lothar U. Kempen, and Farvardin Johansooz "Continuous-tone gray-scale photomasks based on photosensitive spin-on-glass technology for deep-UV lithography applications", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); https://doi.org/10.1117/12.528092

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available