17 December 2003 Effects of reticle reflectance on lithography
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Abstract
We report in this work experimental and theoretical results showing the effects of absorber reflectivity on standard flare measurements, image formation and how this may contribute to various image metrics used in lithography. Our study shows that under typical conditions the reflectance from the absorber film has only a small effect on the image produced by the exposure system.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kevin D. Cummings, Kevin D. Cummings, Bernd Geh, Bernd Geh, Bing Lu, Bing Lu, James R. Wasson, James R. Wasson, Eric Weisbrod, Eric Weisbrod, William J. Dauksher, William J. Dauksher, Kevin J. Nordquist, Kevin J. Nordquist, Pawitter Mangat, Pawitter Mangat, } "Effects of reticle reflectance on lithography", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.516925; https://doi.org/10.1117/12.516925
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