17 December 2003 Induced ESD damage on photomasks: a reticle evaluation
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An Electric-field (E-field) exposure tool for Photomasks was designed, assembled, then utilized to subject 250 nanometer technology node reticles to variable electric fields. A similar study had been demonstrated using the Canary Reticle. The goal was to induce an Electrostatic Discharge (ESD), and attempt to damage the reticle's chrome structures via the Field Induced Damage Model. Electrostatic Discharge emits a radio wave in the 100 MHz to 2.0 GHz frequency range, which can be detected using a Digital Sampling Oscilloscope and antenna. Once detected via radio wave sampling techniques, the Field Induced Damage is evaluated on a KLA STARlight inspection tool, and a damage map provided. A Digital Instruments Atomic Force Microscope utilizes the damage map to locate defects for further evaluation.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrew C. Rudack, Andrew C. Rudack, Michael Pendley, Michael Pendley, Patrick Gagnon, Patrick Gagnon, Lawrence Levit, Lawrence Levit, "Induced ESD damage on photomasks: a reticle evaluation", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.518126; https://doi.org/10.1117/12.518126


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