17 December 2003 Passivation of the 157-nm pellicle with nanometer thin films
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Abstract
The polymeric 157 nm pellicle was passivated on both sides to isolate it from environmental contamination. TAF pellicles were sputter deposited with 5 nm thick films of CaF2, MgF2, Al, Mg, TiN, SiNx, Si, and PTFE, separately. The light transmission and life expectancy of the coated and uncoated pellicles were investigated. The coated pellicles were also analyzed with ESCA for surface structure changes. The coating process changed the pellicle's deterioration mechanism and life expectancy.
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Yue Kuo, Jiang Lu, Jun-Yen Tewg, Paul A. Zimmerman, "Passivation of the 157-nm pellicle with nanometer thin films", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.517506; https://doi.org/10.1117/12.517506
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