17 December 2003 Reticle surface contaminants and their relationship to subpellicle particle formation
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Abstract
Sub-pellicle particle formation continues to be a significant problem in semiconductor fabs. We have previously reported on the identification of various defects detected on reticles after extended use. This paper provides a comprehensive evaluation of various molecular contaminants found on the backside surface of a reticle used in high-volume production. Previously all or most of the photo-induced contaminants were detected under the pellicle. This particular contamination is a white "haze" detected by pre-exposure inspection using KLA-Tencor TeraStar STARlight with Un-patterned Reticle Surface Analysis, (URSA). Chemical analysis was done using Time-of-Flight Secondary Ion Mass Spectroscopy (ToF-SIMS) and Raman spectroscopy.
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Brian J. Grenon, Brian J. Grenon, Kaustuve Bhattacharyya, Kaustuve Bhattacharyya, William Waters Volk, William Waters Volk, Andre Poock, Andre Poock, } "Reticle surface contaminants and their relationship to subpellicle particle formation", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.518105; https://doi.org/10.1117/12.518105
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