Techniques for maximizing yield in nanometer designs

John Ferguson

doi:10.1117/12.518564

17 December 2003 Techniques for maximizing yield in nanometer designs

John Ferguson

Proceedings Volume 5256, 23rd Annual BACUS Symposium on Photomask Technology; (2003) https://doi.org/10.1117/12.518564
Event: Photomask Technology, 2003, Monterey, California, United States

Abstract

As designs grow more complex, process technologies become smaller, and geometry counts increase, the work required to achieve acceptable yeild becomes increasingly demanding and difficult. Underlying this state of affairs is the need to maximize yield without increasing manufacturing costs. This paper addresses techniques for increasing yield as well as suggestions for determining whether yield enhancement techniques are cost effective.

Citation Download Citation

John Ferguson "Techniques for maximizing yield in nanometer designs", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); https://doi.org/10.1117/12.518564

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