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17 December 2003 Yield Mask: the latest developments and their application in a mask house production environment
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Abstract
Yield Mask, the first commercial Yield Management tool specifically developed for a Mask House, has been introduced and the necessity for such Yield Management system, given the current demands on high-end mask production, ascertained. In particular, Yield Mask has been shown to be a highly effective, defect-data analysis tool, with fully automated data collection and a database structure facilitating fast and flexible data retrieval and correlation, for process, inspection, SEM-review and repair data. The latest features of Yield Mask are now reported, including macros, user-definable sampling, user-definable grouping and defect tracking. These features are shown to enhance the efficiency of Yield Mask in a production environment. Macros are shown to significantly decrease the manpower required to run standard analysis routines, accommodating continuous monitoring and analysis of the data. User-definable sampling is shown to allow users to select defects of particular interest, within a given inspection report for subsequent SEM review. This significantly increases the efficiency of review carried out using basic sampling criteria. Lastly, user-definable grouping, along with defect tracking are shown to be advantageous in the selection of any, desired combination of data, for comparison and/or correlation.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Annemarie MacKenzie, Rudolf Laubmeier, Ankush Oberai, Sana Shaikh, and Gerd Stockmann "Yield Mask: the latest developments and their application in a mask house production environment", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); https://doi.org/10.1117/12.517083
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