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15 December 2003 Siloxane-based polymer epoxies for optical waveguides
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Proceedings Volume 5260, Applications of Photonic Technology 6; (2003) https://doi.org/10.1117/12.543436
Event: Applications of Photonic Technology, 2003, Quebec City, Québec, Canada
Abstract
We introduce a new class of siloxane-based epoxy polymers for thin film optical waveguide applications. The thickness of spun-on films can be controlled by varying either spin speed or viscosity using solvents. Cured films exhibit excellent adhesion to silicon oxide and Al and excellent thermal and chemical stability. Waveguides of ~2 micron thickness on silicon oxide exhibit <0.2dB/cm loss at 830 nm. We demonstrate the formation of a 45° vertical mirror using reactive ion etching slope transfer from photoresist to epoxy polymer film.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Ponoth, Peter D. Persans, Ram Ghoshal, N. Agarwal, Joel L. Plawsky, A. Filin, and Q. Z. Fang "Siloxane-based polymer epoxies for optical waveguides", Proc. SPIE 5260, Applications of Photonic Technology 6, (15 December 2003); https://doi.org/10.1117/12.543436
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