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15 December 2003 X-ray reflectometry applied to amorphous carbon thin films prepared by sputtering radio frequency
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Proceedings Volume 5260, Applications of Photonic Technology 6; (2003) https://doi.org/10.1117/12.543948
Event: Applications of Photonic Technology, 2003, Quebec City, Québec, Canada
Abstract
We obtained amorphous carbon (a-C) thin films, deposited on glass and silicon substrates, by sputtering radio frequency (RF) from a pure graphite target. The properties of these layers are studied by x-ray reflectometry. We present here a precise and simple method to measure layer thicknesses and densities.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ismail Aboudihab, Elmaati Ech-chamikh, and Roger A. Lessard "X-ray reflectometry applied to amorphous carbon thin films prepared by sputtering radio frequency", Proc. SPIE 5260, Applications of Photonic Technology 6, (15 December 2003); https://doi.org/10.1117/12.543948
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