Paper
27 February 2004 Comparison of texture features for segmentation of patterned wafers
Author Affiliations +
Proceedings Volume 5266, Wavelet Applications in Industrial Processing; (2004) https://doi.org/10.1117/12.516500
Event: Photonics Technologies for Robotics, Automation, and Manufacturing, 2003, Providence, RI, United States
Abstract
In the last decade, the accessibility of inexpensive and powerful computers has allowed true digital holography to be used for industrial inspection using a microscopy. This technique allows capturing a complex image of a scene, and reconstructing the phase and magnitude information. This type of image gives a new dimension to texture analysis since the topology information can be used as an additional way to extract features. This new technique can be used to extend our previous work on image segmentation of patterned wafers for defect detection. This paper presents a comparison between the features obtained using Gabor filtering on complex (i.e. containing magnitude and phase) images under illumination and focus variations.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Pierrick Bourgeat, Fabrice Meriaudeau, Kenneth W. Tobin Jr., and Patrick Gorria "Comparison of texture features for segmentation of patterned wafers", Proc. SPIE 5266, Wavelet Applications in Industrial Processing, (27 February 2004); https://doi.org/10.1117/12.516500
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Image segmentation

Semiconducting wafers

Image filtering

Image processing

3D image reconstruction

Digital holography

Holograms

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