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10 June 2004 Laser-induced bulk damage of impurity-doped silica glasses (Abstract Only)
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Silica glasses can be used as optical material in various applications such as deep-ultraviolet lithography and nuclear fusion, because they have no internal absorption and extremely small defects. In these applications, laser-induced bulk damage is an important factor in practical use. The laser-induced damage threshold (LIDT) is expected to depend on the types and production conditions of silica glasses. In this paper, the LIDT of synthetic fused silica which contains 4~1220ppm of OH, 1.7x1018~2x1019 molecules/cm3 of H2, and 100~3700 ppm of fluorine were studied by irradiating the higher harmonics of Nd:YAG laser at 355 and 266 nm with pulse width of 4 ns. Current experimental results show that the improvement of the LIDT with impurity contained silica glass is possible.
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Kunio Yoshida, Y. Tsuboi, S. Yamagishi, Kanyoshi Ochi, S. Kuzuu, Tomosumi Kamimura, Akira Fujinoki, and Takayuki Okamoto "Laser-induced bulk damage of impurity-doped silica glasses (Abstract Only)", Proc. SPIE 5273, Laser-Induced Damage in Optical Materials: 2003, (10 June 2004);

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