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10 June 2004 Laser-induced bulk damage of impurity-doped silica glasses (Abstract Only)
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Abstract
Silica glasses can be used as optical material in various applications such as deep-ultraviolet lithography and nuclear fusion, because they have no internal absorption and extremely small defects. In these applications, laser-induced bulk damage is an important factor in practical use. The laser-induced damage threshold (LIDT) is expected to depend on the types and production conditions of silica glasses. In this paper, the LIDT of synthetic fused silica which contains 4~1220ppm of OH, 1.7x1018~2x1019 molecules/cm3 of H2, and 100~3700 ppm of fluorine were studied by irradiating the higher harmonics of Nd:YAG laser at 355 and 266 nm with pulse width of 4 ns. Current experimental results show that the improvement of the LIDT with impurity contained silica glass is possible.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kunio Yoshida, Y. Tsuboi, S. Yamagishi, Kanyoshi Ochi, S. Kuzuu, Tomosumi Kamimura, Akira Fujinoki, and Takayuki Okamoto "Laser-induced bulk damage of impurity-doped silica glasses (Abstract Only)", Proc. SPIE 5273, Laser-Induced Damage in Optical Materials: 2003, (10 June 2004); https://doi.org/10.1117/12.524858
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