2 April 2004 Fabrication of micromachined ceramic thin-film-type pressure sensors for overpressure tolerance and its characteristics
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Abstract
This paper describes the fabrication process and characteristics of ceramic thin-film pressure sensors based on Ta-N strain gauges for harsh environment applications. The Ta-N thin-film strain gauges are sputter-deposited on a thermally oxidized micromachined Si diaphragm with buried cavities for overpressure tolerance. The proposed device takes advantage of the good mechanical properties of single-crystalline Si as a diaphragm fabricated by SDB and electrochemical etch-stop technology, and in order to extend the temperature range, it has relatively higher resistance, stability and gauge factor of Ta-N thin-films more than other gauges. The fabricated pressure sensor presents a low temperature coefficient of resistance, high-sensitivity, low nonlinearity and excellent temperature stability. The sensitivity is 1.21-1.097 mV/V•kgf/cm2 in temperature ranges of 25-200°C and a maximum non-linearity is 0.43 %FS.
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Gwiy-Sang Chung, Gwiy-Sang Chung, Jae-Min Kim, Jae-Min Kim, } "Fabrication of micromachined ceramic thin-film-type pressure sensors for overpressure tolerance and its characteristics", Proc. SPIE 5276, Device and Process Technologies for MEMS, Microelectronics, and Photonics III, (2 April 2004); doi: 10.1117/12.522876; https://doi.org/10.1117/12.522876
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