Paper
25 March 2004 Effect of surface electronic properties of ITO on luminance efficiency of OLEDs
Furong Zhu, Hu Jian Qiao, Liew Yoon Fei, Kian Soo Ong, Xiaotao Hao
Author Affiliations +
Proceedings Volume 5277, Photonics: Design, Technology, and Packaging; (2004) https://doi.org/10.1117/12.523950
Event: Microelectronics, MEMS, and Nanotechnology, 2003, Perth, Australia
Abstract
We report the results of an effort to understand the effect of surface electronic structure of indium tin oxide (ITO) on luminance efficiency of organic light-emitting devices (OLED)s. Nitric oxide (NO) plasma was used to modify the ITO. NO plasma induced an increase in the sheet resistance of ITO. The surface electronic structure of ITO was studied using X-ray photoelectron spectroscopy. An approximately 4-nm thick low conductivity layer with a production of N-O type species was formed near the ITO surface region. It is demonstrated that the barrier for hole-injection from an ITO anode to a hole transporting layer can be engineered by NO plasma treatment. The increase in luminance efficiency of the OLEDs reflects an improved current balance in the device.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Furong Zhu, Hu Jian Qiao, Liew Yoon Fei, Kian Soo Ong, and Xiaotao Hao "Effect of surface electronic properties of ITO on luminance efficiency of OLEDs", Proc. SPIE 5277, Photonics: Design, Technology, and Packaging, (25 March 2004); https://doi.org/10.1117/12.523950
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KEYWORDS
Organic light emitting diodes

Plasma treatment

Plasma

Resistance

Electrons

Tin

Oxides

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