Study on improvement of resolution in photolithographic patterns with pupil phase-shift filtering

Xunan Chen; Jianping Shi; Xiangang Luo; Xiqiao Kang; Tao Qin

doi:10.1117/12.538826

25 September 2003 Study on improvement of resolution in photolithographic patterns with pupil phase-shift filtering

Xunan Chen, Jianping Shi, Xiangang Luo, Xiqiao Kang, Tao Qin

Proceedings Volume 5286, Third International Symposium on Multispectral Image Processing and Pattern Recognition; (2003) https://doi.org/10.1117/12.538826
Event: Third International Symposium on Multispectral Image Processing and Pattern Recognition, 2003, Beijing, China

Abstract

In order to improve photolithographic resolution and focal depth of a projection photolithographic imaging system with an enough large numerical aperture, the basic principle of pupil phase-shift filtering has been investigated in detail. The mathematical model of filtering, the simulation and the photolithographic experiments have been carried. The theoretical analysis and experimental results show that both the photolithographic resolution and focal depth have been obviously improved with pupil phase-shift filtering. At the same time, the photolithographic window has been increased. Compared with amplitude filtering, the utilization of light energy and the potential ability to improve image quality of the phase filtering technique is fully excavated. It is an effective wavefront engineering technique for improving both photolithographic resolution and focal depth.

Citation Download Citation

Xunan Chen, Jianping Shi, Xiangang Luo, Xiqiao Kang, and Tao Qin "Study on improvement of resolution in photolithographic patterns with pupil phase-shift filtering", Proc. SPIE 5286, Third International Symposium on Multispectral Image Processing and Pattern Recognition, (25 September 2003); https://doi.org/10.1117/12.538826

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KEYWORDS

Image filtering

Photomasks

Imaging systems

Optical filters

Semiconducting wafers

Light sources

Image resolution

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