29 June 2004 Holographic method for obtaining images of two-dimensional objects with limiting high-resolution for extreme short-wave lithography problems
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Abstract
Modern photolithography is based on the use of excimer lasers with the radiation wavelength of 193 nm and 157 nm. Further steps aimed at achieving a higher resolution of displayed structures lead to a reduction of the radiation wavelength and a considerable rise of the cost of lithographic system. In this connection, the search of alternative image generation methods being suitable for the use in extreme short-wave photolithography is becoming especially urgent. In order to develop an alternative method based on optical holographic principles, two versions of schemes for recording and reconstruction of relief-phase reflection holograms providing speckle-free images of two-dimensional microscopic objects have been scientifically justified and experimentally verified. The first of them is based on the replacement of projection objective with relief-phase reflection hologram-projector registered on chalcogenide glassy layer. The second one is closed to the near-field correction being conventional for photolithography. As a result of this work, samples of holograms-projectors forming an image of the photolithographic test-object with the characteristic size of 0.8 μm at the wavelength of 0.488 μm were obtained. On the whole, the results show an availability of further works aimed at the implementation of optical holographic methods into short-wave photolithography.
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Sergey N. Koreshev, Sergey N. Koreshev, Vladilsav P. Ratushnyi, Vladilsav P. Ratushnyi, } "Holographic method for obtaining images of two-dimensional objects with limiting high-resolution for extreme short-wave lithography problems", Proc. SPIE 5290, Practical Holography XVIII: Materials and Applications, (29 June 2004); doi: 10.1117/12.525988; https://doi.org/10.1117/12.525988
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