PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
Ionized cluster Beams (ICB) are widely used to deposit metal, semiconductor and insulating films. The paper describes the current state of this technology in both fundamental and applications areas. One important ambiguity in the theory of metal cluster formation is addressed. RBS is used to measure the extent of any displacement of surface atoms caused by ICB. The minimal amount of such surface damage is confirmed by the close-to-ideal values measured for Schottky barrier height on an Al/Si interface. Several examples of ICB application are described.
I. Yamada,T. Takagi,P. R. Younger, andJ. Blake
"Ionized Clusters: A Technique For Low Energy Ion Beam Deposition", Proc. SPIE 0530, Advanced Applications of Ion Implantation, (9 April 1985); https://doi.org/10.1117/12.946470
ACCESS THE FULL ARTICLE
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
The alert did not successfully save. Please try again later.
I. Yamada, T. Takagi, P. R. Younger, J. Blake, "Ionized Clusters: A Technique For Low Energy Ion Beam Deposition," Proc. SPIE 0530, Advanced Applications of Ion Implantation, (9 April 1985); https://doi.org/10.1117/12.946470