Femtosecond breakdown and pre-breakdown behavior in thin dielectric films

Mark Mero; Jianhua Liu; Ali J. Sabbah; Joachim Zeller; Wolfgang G. Rudolph; Kai Starke; Detlev Ristau

doi:10.1117/12.538218

1 June 2004 Femtosecond breakdown and pre-breakdown behavior in thin dielectric films

Mark Mero, Jianhua Liu, Ali J. Sabbah, Joachim Zeller, Wolfgang G. Rudolph, Kai Starke, Detlev Ristau

Proceedings Volume 5340, Commercial and Biomedical Applications of Ultrafast Lasers IV; (2004) https://doi.org/10.1117/12.538218
Event: Lasers and Applications in Science and Engineering, 2004, San Jose, Ca, United States

Abstract

Dielectric oxide and fluoride films used for optical coatings are studied with femtosecond laser pulses with respect to their breakdown and pre-breakdown behavior. A phenomenological model with only three figures of merit is used to explain the measured breakdown thresholds for pulse durations from 25 fs to 1 ps. The temporal evolution of the dielectric constant in the pre-breakdown regime is obtained from transient reflection and transmission measurements after taking into account standing wave effects of pump and probe. In addition to electron-electron and electron-phonon scattering processes, the creation of a new sample state after a few hundred fs is observed. The experimental data are explained with a computer simulation based on the Boltzmann equation.

Citation Download Citation

Mark Mero, Jianhua Liu, Ali J. Sabbah, Joachim Zeller, Wolfgang G. Rudolph, Kai Starke, and Detlev Ristau "Femtosecond breakdown and pre-breakdown behavior in thin dielectric films", Proc. SPIE 5340, Commercial and Biomedical Applications of Ultrafast Lasers IV, (1 June 2004); https://doi.org/10.1117/12.538218

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