Paper
30 December 2003 Original technology applied for manufacturing a cantilever-type piezoresistive micro-accelerometer
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Abstract
An original new design for manufacturing a piezo-resistive type micro-accelerometer made by Si bulk micro-machining is proposed. The enhancements applied by the authors especially in design and also in processing and control techniques lead to a more precise device, having a superior reliability. Opposite to classical type, the new model have shorter cantilever, enabling to have an uniform stress and so permitting us a long piezo-resistor design. This in turn enables the use of low surface boron concentration of diffused resistors, resulting in a low temperature drift. After ANSIS simulation, showing the benefits of this new design, it follows the description of layout-based surface and volume control elements, and finally the processing enhancements applied to give a 1g piezo-resistive accelerometer
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Niculae N. Dumbravescu and Alin Enescu "Original technology applied for manufacturing a cantilever-type piezoresistive micro-accelerometer", Proc. SPIE 5342, Micromachining and Microfabrication Process Technology IX, (30 December 2003); https://doi.org/10.1117/12.530523
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KEYWORDS
Etching

Reticles

Silicon

Photomasks

Lithography

Gold

Micromachining

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