23 December 2003 Improvement in reliability of MEMS resonator using multilayers
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Proceedings Volume 5343, Reliability, Testing, and Characterization of MEMS/MOEMS III; (2003); doi: 10.1117/12.524442
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States
Abstract
Many promising applications of MEMS based devices are in critical systems. Hence, their reliability has become an important issue. The techniques used for the fabrication of these devices give rise to large residual stresses. This coupled with their high speeds of operation make them prone to fatigue failure. The focus of this work is the improvement of reliability under fatigue loading using multi-layers. This paper demonstrates that by adjusting the thickness ratios, the stress in a multi-layered resonator can be prevented from alternating. Moreover, the peak stress can be minimized and performance can be improved in harsh environments.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Prakash R. Apte, Priyadarshan U Patankar, Nilesh S Birari, "Improvement in reliability of MEMS resonator using multilayers", Proc. SPIE 5343, Reliability, Testing, and Characterization of MEMS/MOEMS III, (23 December 2003); doi: 10.1117/12.524442; https://doi.org/10.1117/12.524442
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KEYWORDS
Resonators

Microelectromechanical systems

Reliability

Silicon

Silica

Optical simulations

Oxides

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