29 December 2003 At the limit of nondispersive micro- and nanofocusing mirror optics
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Proceedings Volume 5347, Micromachining Technology for Micro-Optics and Nano-Optics II; (2003) https://doi.org/10.1117/12.533345
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States
Abstract
We describe x-ray Kirkpatrick-Baez mirror designs with the potential to produce hard x-ray beams of 40 nm or smaller. The x-ray quality mirrors required to achieve the desired performance can be fabricated by differential deposition on ultra-smooth surfaces, or by differential polishing. Various mirror systems designed for nanofocusing to ~40 nm and below are compared. The performance limits of total-external-reflection mirrors are compared with the limits of multilayer mirrors that can potentially focus to an even smaller spot size. The advantages of side-by-side Kirkpatrick-Baez mirrors are evaluated and more advanced, four-mirror systems with significantly greater geometrical demagnification are discussed. These systems can potentially reach 5 - 20 nm focal spot sizes for multilayer and total-external-reflection optics respectively.
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Gene E. Ice, Eliot David Specht, Jonathan Z. Tischler, Ali M. Khounsary, Lahsen Assoufid, Chian Liu, "At the limit of nondispersive micro- and nanofocusing mirror optics", Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); doi: 10.1117/12.533345; https://doi.org/10.1117/12.533345
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