29 December 2003 At the limit of nondispersive micro- and nanofocusing mirror optics
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Proceedings Volume 5347, Micromachining Technology for Micro-Optics and Nano-Optics II; (2003) https://doi.org/10.1117/12.533345
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States
We describe x-ray Kirkpatrick-Baez mirror designs with the potential to produce hard x-ray beams of 40 nm or smaller. The x-ray quality mirrors required to achieve the desired performance can be fabricated by differential deposition on ultra-smooth surfaces, or by differential polishing. Various mirror systems designed for nanofocusing to ~40 nm and below are compared. The performance limits of total-external-reflection mirrors are compared with the limits of multilayer mirrors that can potentially focus to an even smaller spot size. The advantages of side-by-side Kirkpatrick-Baez mirrors are evaluated and more advanced, four-mirror systems with significantly greater geometrical demagnification are discussed. These systems can potentially reach 5 - 20 nm focal spot sizes for multilayer and total-external-reflection optics respectively.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gene E. Ice, Gene E. Ice, Eliot David Specht, Eliot David Specht, Jonathan Z. Tischler, Jonathan Z. Tischler, Ali M. Khounsary, Ali M. Khounsary, Lahsen Assoufid, Lahsen Assoufid, Chian Liu, Chian Liu, } "At the limit of nondispersive micro- and nanofocusing mirror optics", Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); doi: 10.1117/12.533345; https://doi.org/10.1117/12.533345


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