29 December 2003 Design and fabrication of advanced EUV diffractive elements
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Proceedings Volume 5347, Micromachining Technology for Micro-Optics and Nano-Optics II; (2003) https://doi.org/10.1117/12.537195
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States
Abstract
As extreme ultraviolet (EUV) lithography approaches commercial reality, the development of EUV-compatible diffractive structures becomes increasingly important. Such devices are relevant to many aspects of EUV technology including interferometry, illumination, and spectral filtering. Moreover, the current scarcity of high power EUV sources makes the optical efficiency of these diffractive structures a paramount concern. This fact has led to a strong interest in phase-enhanced diffractive structures. Here we describe recent advancements made in the fabrication of such devices.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Patrick P. Naulleau, Patrick P. Naulleau, James Alexander Liddle, James Alexander Liddle, Farhad Salmassi, Farhad Salmassi, Erik H. Anderson, Erik H. Anderson, Eric M. Gullikson, Eric M. Gullikson, } "Design and fabrication of advanced EUV diffractive elements", Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); doi: 10.1117/12.537195; https://doi.org/10.1117/12.537195
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