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29 December 2003 High-sensitivity material systems for two-photon three dimensional microfabrication
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Proceedings Volume 5347, Micromachining Technology for Micro-Optics and Nano-Optics II; (2003) https://doi.org/10.1117/12.532614
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States
Abstract
A photoacid generator (PAG) is described that can be efficiently activated by two-photon excitation and can be used for high-sensitivity three-dimensional micro-patterning of acid-sensitive media. The molecule has been specifically engineered to have both a large peak two-photon absorption cross section (δ = 690 x 10-50 cm4 s photon-1 at 705 nm) and a high quantum yield for the photochemical generation of acid (φH+ ≈ 0.5). Under near-infrared laser irradiation, the PAG produces acid subsequent to two-photon excitation and initiates the polymerization of epoxides. The PAG was used in conjunction with the epoxide resist SU-8 for negative-tone three-dimensional microfabrication and was incorporated into a specially formulated chemically amplified resist for positive-tone fabrication of a three-dimensional grating structure. These material systems expand the potential of three-dimensional microfabrication as a tool for manufacturing micro-electromechanical systems, micro-fluidics, and micro-optical structures.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stephen M. Kuebler, Joseph W. Perry, Seth R. Marder, Christopher Kemper Ober, Kevin L. Braun, Tianyue Yu, and Wenhui Zhou "High-sensitivity material systems for two-photon three dimensional microfabrication", Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); https://doi.org/10.1117/12.532614
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