29 December 2003 Microfabrication of chiral optic materials and devices
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Proceedings Volume 5347, Micromachining Technology for Micro-Optics and Nano-Optics II; (2003) https://doi.org/10.1117/12.531754
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States
Abstract
Chiral thin films have been demonstrated to have significant optical activity and device applications for gratings, filters, retarders and optical switches. These helically nanostructured films may be microfabricated onto silicon or other substrates utilizing the Glancing Angle Deposition (GLAD) technique with various nanostructures such as helices, chevrons, or polygonal spirals. GLAD is a simple one-step process that enables ready integration of these structures onto optical chips. As proposed by Toader and John, the GLAD technique can be used to fabricate large bandwidth photonic crystals based on the diamond lattice. This structure yields a predicted photonic bandgap as much as 15% of the gap center frequency. Moreover, the corresponding inverse square spiral structure is predicted to have a photonic bandgap as much as 24% of the gap center frequency. We report the details of basic chiral thin film fabrication and calibration. We will also discuss optical characteristics of the chiral films such as the optical rotatory power. Finally, we present the results of our efforts to fabricate square spiral and inverse square spiral structures.
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Mark A Summers, Mark A Summers, Scott Kennedy, Scott Kennedy, Anastasia Elias, Anastasia Elias, Martin Jensen, Martin Jensen, Ken Harris, Ken Harris, Brian Szeto, Brian Szeto, Michael J Brett, Michael J Brett, } "Microfabrication of chiral optic materials and devices", Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); doi: 10.1117/12.531754; https://doi.org/10.1117/12.531754
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