24 January 2004 Application of spatial light modulators for microlithography
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Proceedings Volume 5348, MOEMS Display and Imaging Systems II; (2004) https://doi.org/10.1117/12.528798
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States
Abstract
The Fraunhofer IPMS and Micronic Laser Systems AB have developed a technology for the maskless DUV microlithography using spatial light modulation (SLM). This technology uses an array of micromirrors as a pro-programable mask, which allows writing up to 1 million pixels with a framerate of up to 2 kHz. The SLM is fabricated at the IPMS using its high-voltage CMOS process. The mirrors are fabricated by surface micromachining using a polymer as sacrificial layer. The mirrors are operated in an analog mode to allow sub-pixel placement of the features.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ulrike A Dauderstaedt, Peter Duerr, Tord Karlin, Harald Schenk, and Hubert Lakner "Application of spatial light modulators for microlithography", Proc. SPIE 5348, MOEMS Display and Imaging Systems II, (24 January 2004); doi: 10.1117/12.528798; https://doi.org/10.1117/12.528798
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