Toward multifunctional optical integration: an adaptive lithographic method for patterning optical structures

Samhita Dasgupta; Min-Yi Shih; Thomas Gorczyca; Ernest Balch; Glenn Claydon; Leonard Douglas; Todd Tolliver; Matthew Nielsen

doi:10.1117/12.529934

18 June 2004 Toward multifunctional optical integration: an adaptive lithographic method for patterning optical structures

Samhita Dasgupta, Min-Yi Shih, Thomas Gorczyca, Ernest Balch, Glenn Claydon, Leonard Douglas, Todd Tolliver, Matthew Nielsen

Author Affiliations +

Proceedings Volume 5351, Organic Photonic Materials and Devices VI; (2004) https://doi.org/10.1117/12.529934
Event: Integrated Optoelectronic Devices 2004, 2004, San Jose, CA, United States

Abstract

A new method of interconnecting various optoelectronic components is discussed. Offset error up to 25 microns can be corrected to achieve single mode alignment accuracies. Several planar optical devices were photocomposed using the adaptive photolithographic method and these have been shown to perform with the desired characteristics.

Citation Download Citation

Samhita Dasgupta, Min-Yi Shih, Thomas Gorczyca, Ernest Balch, Glenn Claydon, Leonard Douglas, Todd Tolliver, and Matthew Nielsen "Toward multifunctional optical integration: an adaptive lithographic method for patterning optical structures", Proc. SPIE 5351, Organic Photonic Materials and Devices VI, (18 June 2004); https://doi.org/10.1117/12.529934

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